dielectric_LUTDAVIS

[shao-yang]

hello,everyone. I have a question, I would like to ask you to help me. A LYSO wraped by teflon.
G4OpticalSurface* OpRefCrySurface1 =new G4OpticalSurface(“LYSO-teflon-Surface”);
OpRefCrySurface1->SetType(dielectric_LUTDAVIS);
OpRefCrySurface1->SetModel(DAVIS);
OpRefCrySurface1->SetFinish(PolishedTeflon_LUT);

I find light collection efficiency is same when setFinish is PolishedTeflon_LUT or PolishedESR_LUT.
Is this normal?
And When I set the Boundary Process is dieltectric_dieltectric、 UNIFIED、groundbackpainted、SigmaAlpha=0.1.The light collection efficiency is 20%.But when I do not use reflector, the light collection efficiency is 33%.
Thanks.

[ykarakas]

Dear Shao,

@shao-yang

And When I set the Boundary Process is dieltectric_dieltectric、 UNIFIED、groundbackpainted、SigmaAlpha=0.1.The light collection efficiency is 20%.But when I do not use reflector, the light collection efficiency is 33%.

Since you use groundbackpainted as the surface finish the surface won’t let particles escape from the surface and it will either absorb or reflect it. So, my assumption is that the surface is absorbing more particle than expected because you have defined “G4double absorptionLengthPTFE[nEntries]” shorter than it should be.