MicroElec Tungsten 200eV-4keV electrons

Hello,

I am trying to simulate 200eV-4keV electrons hitting a tungsten wall at normal incidence and measuring the SEE and BSE yield on a closeby detector. I am implementing MicroElec in order to track secondary electrons less than 10 eV. I am using vacuum as my world region and near enough a copy paste of the MicroElecPhysics.cc provided in the electromagnetic example which includes materials such as W. The simulation runs however my SEE yield is a factor of 2 greater than expected and there are too many secondaries created. I have tried changing the minimum electron energy to 5 eV but this does not make much difference. In a paper by the creators, they manage to produce an SEE yield for W peaking around 1.5. Any guidance on where i could start to try and figure out where/why there are too many secondary creations would be great. Thank you.

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